7、本文較系統地評述了光誘導化學汽相澱積(LCVD)技術澱積非晶硅薄膜的開發現;
3、Experimental Research on Photomask Repair System Using Laser Induced Chemical Vapor Deposition(LCVD) Method;
8、簡要概述了脈衝激光蒸發澱積(PLED)和激光誘導化學氣相澱積(LCVD)的基本原理、澱積系統和激光器。
5、In order to repair the clear defects of photomask, photolytic LCVD process is required to initiate the chemical reactions.
4、主要介紹了LCVD 澱積非晶硅薄膜的機理; 評價了LCVD 澱積非晶硅薄膜的電學和光學特*。
6、The basic principles, deposition systems and laser sources of pulsed laser evaporation deposition (PLED) and laser-induced chemical vapor deposition (LCVD) are simply introduce.
2、The wide application prospect of LCVD technology is describ…
1、The wide application prospect of LCVD technology is described here.