7、Uses: sputtering target, physical vapor deposition, high temperature alloys.
11、The basic principles, deposition systems and laser sources of pulsed laser evaporation deposition (PLED) and laser-induced chemical vapor deposition (LCVD) are simply introduce.
15、Synthesis of mesoporous nitrogen-doped carbon nanoparticles by detonation-assisted chemical vapor deposition
19、The device structure is optimized firstly, then the structure is grown by metal organic chemical vapor deposition (MOCVD).
23、The research status and development trend of surface treatments, such as nitriding, vapor deposition, plasma modification and multiplex surface treatment technology used for cutting tools were described.
27、The main cause of signal's decrease in infrared channel of spacecraft flying remote sensing instrumentation is water vapor deposition on the surface of low temperature optical instruments which released from materials.
4、modified chemical vapor deposition
9、Deposition of Y_2O_3 thin films by electrostatic spray assisted vapor deposition method
14、Structural changes in carbon produced by a sulfur-aided catalytic chemical vapor deposition
20、The dry plating method is a method for deposition of a metal on the surface of polymer material under vacuum and includes sputtering method, vapor deposition, vacuum deposition, etc.
25、This symmetric growth mode is induced by the shape changes in copper nanocrystals during catalyzing the chemical vapor deposition of acetylene.
3、photochemical vapor deposition oxide
10、Microcrystalline silicon thin films prepared at different deposition parameters using very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD).
17、The triangular pits eliminate of (110) a-plane GaN growth by metal-orgamic chemical vapor deposition
24、Template growth of gallium nitride nanowires was demonstrated by metal organic chemical vapor deposition (MOCVD) with carbon nanotubes as templates in this paper.
5、metallo organic chemical vapor deposition
13、Fabrication of transparent conductive AZO (ZnO:Al) film by plasma enhanced chemical vapor deposition
22、The refractory metals and refractory metal silicides that are used to augment or replace the polysilicon are generally deposited by physical vapor deposition processes.
6、laser induction chemical vapor deposition method
18、Ir films were prepared by metal-organic chemical vapor deposition (MOCVD) method using iridium tri-acetylacetonate precursors on molybdenum substrates.
2、plasma chemical vapor deposition
21、The article has introduced the application and development tendency of techniques of film making with chemical vapor deposition in all fields.
12、Principle and research development of powder materials prepared by chemical vapor deposition
8、Synthesis of monodisperse Cu nano-particle template by vapor deposition
16、Carbon nanotube films were synthesized on Ni substrate by microwave plasma chemical vapor deposition at low temperature.
1、chemical vapor deposition reactor
26、When chemical vapor deposition is used to grow graphene it is normally made up of individually grown sheets that bloom in the outward direction from hot catalysts until they meet each other.
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