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發表於:2018-03-18
Thehighersputteringyieldwouldresultfrommultiplecollision,lateralsputteringandhighdensityenergydepositionofgasclusterionbeam.Thesputteringyieldperclusterionishigherthantha...
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發表於:2017-11-16
CharacteristicsofHfO_xN_ythinfilmsbyrfreactivesputteringatdifferentdepositiontemperaturesEffectofTechnologicalparametersondepositionrateofZAOfilmspreparedbyDCmagnetronrea...
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發表於:2018-08-28
Developmentofhigh-powerpulsemagnetronsputteringtechnologyTheapplicationofthin-filmsputteringtechnologyindownholeTOR&WOBmeasurement...