公司生產的300mmPrimoD-RIE系統（去耦反應離子刻蝕）基於雙工作站，小批量造型集羣（mini-batchcluster，mini-batch指每批生產的晶圓不超過十片）架構，為單芯片生產系統，裝備甚高頻去耦反應離子刻蝕源。
RIE of SiO_2 Nanoparticles and Its Application in Preparation of Silicon Nanopillar Array
It is the intention of the LME to seek RIE authorisation for the new joint venture.
Its 300-mm Primo D-RIE system leverages a twin-station, mini-batch cluster architecture with a single-wafer environment and a VHF de-coupled RIE plasma source.
Nanoparticle s、Carbon Nanotube Self-assemble and the Silicon Nanopillar Arrays Fabrication by RIE;
Its result was conformed by animal NIH method. The experiments result showed that the RIE have several characteristics such as special, good reproducibility and easy to operate.
The RIE and sidewall insulation are adopted while alignment is not needed. The technology makes the contact window position in the center of emitter precisely.
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